JSR Corporation
News releases
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JSR to make Yamanaka Hutech, a manufacturer of high-purity chemicals for semiconductors, a wholly owned subsidiary
JSR Corporation reached an agreement with Yamanaka Hutech Corporation to acquire all of its shares and make it a wholly owned subsidiary. YHC manufactures and sells high-purity chemicals for semico...
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New Energy Collaborative Aims to Accelerate Creation of Low-Carbon Energy Access in Asia-Pacific for the Semiconducto...
Aiming to reduce global semiconductor ecosystem carbon emissions, SEMI and the SCC have created the EC to understand and clear roadblocks to the installation of low-carbon energy sources in the Asi...
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FLOSFIA and JSR progress toward practical use of the world's first P-type semiconductor, Iridium Gallium Oxide
Development of new iridium-based film formation materials for mass production creates a solution for realizing the ultimate SEMI ecology™
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JSR and IBM Quantum Envision a Revolution in Semiconductor Manufacturing
IBM and JSR chart a new future for the global semiconductor industry, with quantum computing solutions to hard chemical engineering problems
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JSR Received the 2022 TSMC Excellent Performance Award from TSMC
JSR Corporation (Headquarters: Minato-ku, Tokyo, CEO: Eric Johnson, hereinafter "JSR") received the 2022 TSMC Excellent Performance Award for Excellent Material Development and Production Support i...
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JSR Joins Semiconductor Climate Consortium as Founding Member
Tokyo, Japan – November 2, 2022 — JSR Corporation today announced it has become a founding member of the new Semiconductor Climate Consortium (SCC), a group formed with other companies from across ...
In the news
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Imec Demonstrates 20nm Pitch Line/Space Resist Imaging with High-NA EUV Interference Lithography ...
![Imec Pushes Single-Exposure Patterning Capability of 0.33NA EUVL to its Extreme Limits | imec](https://d21buns5ku92am.cloudfront.net/69761/clipping_images/medium-1716555659-Figure_1_-_28nm_pitch_single_exposure_patterning_after_Ru_metallization.jpg)
Imec Pushes Single-Exposure Patterning Capability of 0.33NA EUVL to its Extreme Limits | imec
![Samsung to Diversify Photoresist (PR) for EUV... Seeking to Apply U.S. Inpria's PR](https://d21buns5ku92am.cloudfront.net/69761/clipping_images/medium-1716555580-cms_temp_article_27162614457458.jpg)
Samsung to Diversify Photoresist (PR) for EUV... Seeking to Apply U.S. Inpria's PR
![Inpria begins making inorganic photoresist for EUV](https://d21buns5ku92am.cloudfront.net/69761/clipping_images/medium-1716555928-1742_1979_579.jpg)
Inpria begins making inorganic photoresist for EUV
![Corvallis startup lands $31m to help build next-generation computer chips](https://d21buns5ku92am.cloudfront.net/69761/clipping_images/medium-1716556194-https___arc-anglerfish-arc2-prod-advancelocal.s3.amazonaws.com_public_VFRG5AOJD5FXTANJY62FZKN26U.jpg)
![Corvallis semiconductor startup snags $31M from industry heavyweights - Portland Business Journal](https://d21buns5ku92am.cloudfront.net/69761/clipping_images/medium-1716388860-andrew-grenville-47b.jpg)
Corvallis semiconductor startup snags $31M from industry heavyweights - Portland Business Journal