JSR Corporation
News releases
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JSR Receives High Praise from NEDO's “Pioneering Research Program for Materials Innovation”
JSR's data-driven chemistry project with top universities is lauded by NEDO for innovation in flow polymerization, reducing solvents, and boosting efficiency.
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JSR Completes Acquisition of All Shares in Yamanaka Hutech
JSR completes acquisition of Yamanaka Hutech, enhancing its semiconductor materials lineup and solidifying its market position. This move aligns with JSR's growth strategy.
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JSR to make Yamanaka Hutech, a manufacturer of high-purity chemicals for semiconductors, a wholly owned subsidiary
JSR Corporation reached an agreement with Yamanaka Hutech Corporation to acquire all of its shares and make it a wholly owned subsidiary. YHC manufactures and sells high-purity chemicals for semico...
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New Energy Collaborative Aims to Accelerate Creation of Low-Carbon Energy Access in Asia-Pacific for the Semiconducto...
Aiming to reduce global semiconductor ecosystem carbon emissions, SEMI and the SCC have created the EC to understand and clear roadblocks to the installation of low-carbon energy sources in the Asi...
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FLOSFIA and JSR progress toward practical use of the world's first P-type semiconductor, Iridium Gallium Oxide
Development of new iridium-based film formation materials for mass production creates a solution for realizing the ultimate SEMI ecology™
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JSR and IBM Quantum Envision a Revolution in Semiconductor Manufacturing
IBM and JSR chart a new future for the global semiconductor industry, with quantum computing solutions to hard chemical engineering problems
In the news
Imec Demonstrates 20nm Pitch Line/Space Resist Imaging with High-NA EUV Interference Lithography ...
Imec Pushes Single-Exposure Patterning Capability of 0.33NA EUVL to its Extreme Limits | imec
Samsung to Diversify Photoresist (PR) for EUV... Seeking to Apply U.S. Inpria's PR
Inpria begins making inorganic photoresist for EUV
Corvallis semiconductor startup snags $31M from industry heavyweights - Portland Business Journal