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Imec Demonstrates 20nm Pitch Line/Space Resist Imaging with High-NA EUV Interference Lithography ...
Imec Pushes Single-Exposure Patterning Capability of 0.33NA EUVL to its Extreme Limits | imec
JSR Micro - Bloom Energy
Samsung to Diversify Photoresist (PR) for EUV... Seeking to Apply U.S. Inpria's PR
Corvallis startup lands $31m to help build next-generation computer chips
Corvallis semiconductor startup snags $31M from industry heavyweights - Portland Business Journal